Laser Applications Conference Program

A UNIQUE Opportunity to Network & Learn from Leaders in Applied Industrial R&D

In its second year, The Laser Applications Conference (LAC) is an all invited speaker format for industry in Laser Applications at the OSA Laser Congress. This 3-day meeting focuses on two main topic areas --  Materials Processing and Applications for High Power Lasers.

Materials Processing includes advanced applications for industrial use. Applications for High Power Lasers will include topics such as EUV for Lithography, 16kW+ Laser Applications, X-Ray Generation, Lasers for Space Applications and Tool Making. One of the themes of this meeting will be to initiate discussions on what engineering and production advances are needed to translate promising technological advances into marketable products.

At LAC you’ll be immersed in an innovative learning environment that introduces new, groundbreaking information, offers insightful knowledge, showcases cutting-edge products, and engages your active participation in important debates and discussions.

Program Committee

David Mordaunt, Raytheon Space and Airborne Systems, USA, Chair
Johannes Trbola, Dausinger & Giesen GmbH, Germany,  Chair
Yuji Sano, Japan Science and Technology Agency, Japan, Local Chair
Lahsen Assoufid, Argonne National Lab, USA
Dirk Mueller, Coherent, USA
Barbara Previtali, Politecnico di Milano, Italy
Danijela Rostohar, Inst. of Physics ASCR, Prague
Gerald Uyeno, Raytheon, USA
Rudolf Weber, Univ. of Stuttgart, Germany

View the LAC Schedule

Invited Speakers

*Please continue to check back as additional speakers are confirmed.

Materials Processing
Laurent Berthe, CNRS Lab PIMM, France
Jochen Deile, Coherent, USA
Claus Dold, EWAG AG, Switzerland
Domenico Furfari, AIRBUS France
José L. Ocaña, UPM Laser Centre, Spain
Antti Peltonen, Primoceler, Finland
Yuji Sano, Japan Science and Technology, Japan
Pratik Shukla, Univ. of Coventry, United Kingdom
Oliver Suttmann, Laser Zentrum Hannover, Germany

Applications for High Power Lasers
Ahmed Diallo, Princeton Plasma Physics Lab., USA
Eric Esarey, Lawrence Berkeley Natl. Lab, USA
Andrey Gumenyuk, BAM, Germany
Takeshi Higashiguchi, Utsunomiya University, Japan
Yoshinobu Makino, Toshiba, Japan
Mamiko Nishiuchi, QST, Japan
Volker Onuseit, Univ. of Stuttgart, Germany
Eléonore Roussel, Synchrotron Soleil, France
Daichi Sumimori, NADEX, Japan
Gijs van der Schot, Uppsala Univ., Sweden