Laser Applications Conference Program

 

A UNIQUE Opportunity to Network & Learn from Leaders in Applied Industrial R&D

In its second year, The Laser Applications Conference (LAC) is an all invited speaker format for industry in Laser Applications at the OSA Laser Congress. This 3-day meeting focuses on two main topic areas --  Materials Processing and Applications for High Power Lasers.

Materials Processing includes advanced applications for industrial use. Applications for High Power Lasers will include topics such as EUV for Lithography, 16kW+ Laser Applications, X-Ray Generation, Lasers for Space Applications and Tool Making. One of the themes of this meeting will be to initiate discussions on what engineering and production advances are needed to translate promising technological advances into marketable products.


At LAC, you’ll be immersed in an innovative learning environment that introduces new, groundbreaking information, offers insightful knowledge, showcases cutting-edge products, and engages your active participation in important debates and discussions.

Good value!
This is a comprehensive meeting which includes opportunities to hear leading authorities, attend panel discussions and visit with your vendors.


11 Sessions with over 25 invited speakers
Exhibition with over 70 exhibitors
Access to sessions in the Advanced Solid State Lasers Conference
 

LAC Plenary and Keynote Speaker

High-Order Harmonics: Application and Prospects
Katsumi Midorikawa, Director, RIKEN Center for Advanced Photonics, Japan





Progress of Light Source Technology for Micro-Lithography Application
Hakaru Mizoguchi, Vice President & CTO, Gigaphoton, Japan




 

LAC Program Committee

David Mordaunt, Lockheed Martin, USA, Chair
Johannes Trbola, Dausinger & Giesen GmbH, Germany,  Chair
Yuji Sano, Japan Science and Technology Agency, Japan, Local Chair
Lahsen Assoufid, Argonne National Lab, USA
Dirk Mueller, Coherent, USA
Barbara Previtali, Politecnico di Milano, Italy
Danijela Rostohar, Inst. of Physics ASCR, Prague
Gerald Uyeno, Raytheon, USA
Rudolf Weber, Univ. of Stuttgart, Germany